| dc.contributor.author |
Pavlišta, Martin
|
cze |
| dc.contributor.author |
Zajac, Vít
|
cze |
| dc.contributor.author |
Nazabal, Virginie
|
cze |
| dc.contributor.author |
Gutwirth, Jan
|
cze |
| dc.contributor.author |
Gouttefangeas, Francis
|
cze |
| dc.contributor.author |
Němec, Petr
|
cze |
| dc.date.accessioned |
2019-05-22T08:13:56Z |
|
| dc.date.available |
2019-05-22T08:13:56Z |
|
| dc.date.issued |
2018 |
eng |
| dc.identifier.issn |
0022-3093 |
eng |
| dc.identifier.uri |
https://hdl.handle.net/10195/72583 |
|
| dc.description.abstract |
Pulsed laser deposition exploiting a KrF excimer laser was used to fabricate amorphous As-S thin films from bulk As2S3 glass target. Thickness profile of the film was extracted from variable angle spectroscopic ellipsometry data. The dependence of thickness distribution of prepared thin layer on laser beam plume deflection angle was evaluated and corresponding equations were suggested. |
eng |
| dc.format |
p. 409-411 |
eng |
| dc.language.iso |
eng |
eng |
| dc.relation.ispartof |
Journal of Non-Crystalline Solids, volume 481, issue: February |
eng |
| dc.rights |
embargoed access |
eng |
| dc.subject |
Plume deflection |
eng |
| dc.subject |
Thickness distribution |
eng |
| dc.subject |
PLD |
eng |
| dc.subject |
Chalcogenide |
eng |
| dc.subject |
Thin film |
eng |
| dc.subject |
sklon plazmového oblaku |
cze |
| dc.subject |
tloušťková distribuce |
cze |
| dc.subject |
PLD |
cze |
| dc.subject |
chalkogenid |
cze |
| dc.subject |
tenká vrstva |
cze |
| dc.title |
Analysis of pulsed laser deposited amorphous chalcogenide film thickness distribution: Plume deflection angle dependence |
eng |
| dc.title.alternative |
Analýza tloušťkové distribuce amorfního chalkogenidového filmu připraveného pulzní laserovou depozicí: závislost na úhlu sklonu plazmového oblaku |
cze |
| dc.type |
article |
eng |
| dc.description.abstract-translated |
Pulsní laserová depozice s KrF excimerovým laserem byla použita k přípravě amorfních tenkých vrstev As-S z objemového skla As2S3. Tloušťkový profil filmu byl určen pomocí VASE. Závislost tloušťkové distribuce připravené tenké vrstvy na úhlu sklonu plazmového oblaku byla vyhodnocena s využitím navržených rovnic. |
cze |
| dc.peerreviewed |
yes |
eng |
| dc.publicationstatus |
postprint |
eng |
| dc.identifier.doi |
10.1016/j.jnoncrysol.2017.11.022 |
eng |
| dc.relation.publisherversion |
https://doi.org/10.1016/j.jnoncrysol.2017.11.022 |
eng |
| dc.project.ID |
GA16-17921S/Heterostruktury založené na chalkogenidech pro nelineární optiku a optické senzory |
eng |
| dc.identifier.wos |
000423646200057 |
eng |
| dc.identifier.scopus |
2-s2.0-85034077639 |
|
| dc.identifier.obd |
39880970 |
eng |
