Sub-micrometer soft lithography of a bulk chalcogenide glass

Show simple item record Kohoutek Tomáš Orava Jiří Greer A. Lindsay Fudouzi Hiroshi 2016-11-14T08:19:08Z 2016-11-14T08:19:08Z 2013
dc.identifier.issn 1094-4087
dc.description.abstract We demonstrate, for the first time, time-and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area. A periodic array of submicrometer lines (diffraction grating) with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe2 bulk glass at temperature 225 degrees C, i.e. 5 degrees C below the softening point of the glass. Sub-micrometer soft lithography into chalcogenide bulk glasses shows good reliability, reproducibility and promise for feasible fabrication of various dispersive optical elements, antireflection surfaces, 2D photonic structures and nano-structured surfaces for enhanced photonic properties and chemical sensing. (C) 2013 Optical Society of America eng
dc.format p. 9584-9591 eng
dc.language.iso eng
dc.publisher Optical Society of America eng
dc.relation.ispartof Optics Express, volume 21, issue: 8 eng
dc.rights Pouze v rámci univerzity eng
dc.subject nanoimprint lithography eng
dc.subject imprint lithography eng
dc.subject wave-guides eng
dc.subject fibers eng
dc.subject nanostructures eng
dc.subject fabrication eng
dc.subject micro eng
dc.subject nanoimprint litografie, příprava optických prvků cze
dc.title Sub-micrometer soft lithography of a bulk chalcogenide glass eng
dc.title.alternative Sub-mikronova soft litografie chalkogenidových skel cze
dc.type article eng
dc.description.abstract-translated periodické submikrometroveé difrakční mřížky s periodou 625 nm, amplitudou 625 nm a povrchovou hrubostí 3 nm byly uspesne natisteny do povrchu chalkogenidového skla se složenímAsS2 pomocí metody soft-lithography. cze
dc.peerreviewed yes eng
dc.publicationstatus postprint eng
dc.identifier.doi 10.1364/OE.21.009584 eng
dc.project.ID EE2.3.20.0254/Výzkumný tým pro pokročilé nekrystalické materiály (ReAdMat) eng
dc.identifier.wos 000318151600040 eng
dc.identifier.obd 39869890

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