dc.contributor.author |
Kohoutek Tomáš
|
|
dc.contributor.author |
Orava Jiří
|
|
dc.contributor.author |
Greer A. Lindsay
|
|
dc.contributor.author |
Fudouzi Hiroshi
|
|
dc.date.accessioned |
2016-11-14T08:19:08Z |
|
dc.date.available |
2016-11-14T08:19:08Z |
|
dc.date.issued |
2013 |
|
dc.identifier.issn |
1094-4087 |
|
dc.identifier.uri |
http://hdl.handle.net/10195/66388 |
|
dc.description.abstract |
We demonstrate, for the first time, time-and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area. A periodic array of submicrometer lines (diffraction grating) with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe2 bulk glass at temperature 225 degrees C, i.e. 5 degrees C below the softening point of the glass. Sub-micrometer soft lithography into chalcogenide bulk glasses shows good reliability, reproducibility and promise for feasible fabrication of various dispersive optical elements, antireflection surfaces, 2D photonic structures and nano-structured surfaces for enhanced photonic properties and chemical sensing. (C) 2013 Optical Society of America |
eng |
dc.format |
p. 9584-9591 |
eng |
dc.language.iso |
eng |
|
dc.publisher |
Optical Society of America |
eng |
dc.relation.ispartof |
Optics Express, volume 21, issue: 8 |
eng |
dc.rights |
Pouze v rámci univerzity |
eng |
dc.subject |
nanoimprint lithography |
eng |
dc.subject |
imprint lithography |
eng |
dc.subject |
wave-guides |
eng |
dc.subject |
fibers |
eng |
dc.subject |
nanostructures |
eng |
dc.subject |
fabrication |
eng |
dc.subject |
micro |
eng |
dc.subject |
nanoimprint litografie, příprava optických prvků |
cze |
dc.title |
Sub-micrometer soft lithography of a bulk chalcogenide glass |
eng |
dc.title.alternative |
Sub-mikronova soft litografie chalkogenidových skel |
cze |
dc.type |
article |
eng |
dc.description.abstract-translated |
periodické submikrometroveé difrakční mřížky s periodou 625 nm, amplitudou 625 nm a povrchovou hrubostí 3 nm byly uspesne natisteny do povrchu chalkogenidového skla se složenímAsS2 pomocí metody soft-lithography. |
cze |
dc.peerreviewed |
yes |
eng |
dc.publicationstatus |
postprint |
eng |
dc.identifier.doi |
10.1364/OE.21.009584 |
eng |
dc.project.ID |
EE2.3.20.0254/Výzkumný tým pro pokročilé nekrystalické materiály (ReAdMat) |
eng |
dc.identifier.wos |
000318151600040 |
eng |
dc.identifier.obd |
39869890 |
|